In advanced manufacturing fields such as integrated circuits, MEMS, and optoelectronics, Inductively Coupled Plasma (ICP) etching technology is indispensable for critical processes including deep silicon etching, high-aspect-ratio structure fabrication, and precision pattern transfer. The stability and uniformity of etching results not only depend on the control of plasma density and energy but also rely heavily on a gas delivery system with high cleanliness, tight sealing, and reliable performance. HAINAR HYDRAULICS, a leader in fluid system solutions, introduces its ultra-high purity stainless steel tube assemblies with double ferrule fittings, which serve as the irreplaceable “gas lifeline” for ICP etching systems.
ICP etching machines generate high-density plasma through upper induction coils and achieve high anisotropic etching with the assistance of lower electrode bias. To precisely control etching depth and sidewall angle at the micro-nano scale, the type, ratio, flow rate, and purity of process gases must be stably regulated. Common gases used in etching processes include halogen gases such as Cl₂, SF₆, and BCl₃ for etching silicon and oxides, O₂ as oxidant or ashing agent, Ar and He as plasma stabilizers or diluents, as well as corrosive by-products that need to be promptly extracted by vacuum systems. Any minor gas contamination, leakage, or flow fluctuation can lead to process failures such as uneven etching, sidewall collapse, and particle contamination. This places extreme demands on gas path systems, and HAINAR HYDRAULICS’ ultra-high purity steel tube assemblies are engineered to meet these rigorous requirements.
The core strength of HAINAR HYDRAULICS’ ultra-high purity steel tube assemblies lies in their superior structural design and advanced technical features. The assemblies consist of EP-grade 316L seamless stainless steel tubes with an electropolished inner wall, achieving a surface roughness of Ra < 0.2μm to prevent particle adhesion and precipitation. Equipped with stainless steel double ferrule fittings, the assemblies adopt a metal sealing structure that resists high temperatures, high pressures, and strong corrosion, avoiding organic contamination risks. Each complete assembly undergoes helium mass spectrometry leak testing, ensuring a leak rate lower than 1×10⁻⁹ Pa·m³/s. Additionally, the CGA/SEMI standard ports enable seamless compatibility with mainstream semiconductor equipment worldwide.
These technical advantages translate into multiple performance benefits: ultra-high cleanliness with oil-free and impurity-free processing to meet 6N (99.9999%) gas delivery requirements; excellent airtightness with metal hard sealing for leak-free operation in high-vacuum systems; high reliability with factory prefabrication for quick on-site installation and reliable repeated disassembly; and superior corrosion resistance for long-term stable operation with all mainstream etching gases. The assemblies also support customized solutions, including bent tubes, threaded interfaces, and flange-welded connections, to adapt to diverse application scenarios.
In ICP etching systems, HAINAR HYDRAULICS’ ultra-high purity steel tube assemblies play a critical role in three key system nodes. Firstly, as the main channel for etching process gases, they connect the gas cylinder room to the etching chamber, ensuring lossless and pollution-free transmission of high-purity gases to the plasma reaction area, which is the core guarantee for etching quality stability. Secondly, in the front and rear sections of MFC (Mass Flow Controller), the assemblies work with double ferrule fittings to achieve precise and controllable gas flow, assisting in the consistent control of process parameters. Thirdly, in the vacuum exhaust path, the corrosion-resistant steel tube assemblies cooperate with vacuum valves and cold traps to realize residue-free extraction of etching by-products, effectively reducing vacuum chamber contamination rates and equipment cleaning frequency.
A common question in the industry is why hoses cannot be used as substitutes in ICP main gas path systems. While industrial hoses are suitable for low-requirement systems such as purging and cooling water, they have significant limitations in critical ICP applications: difficulty in meeting cleanliness requirements with potential extractable risks, easy aging, gas permeation, and pressure deformation during long-term use, poor airtightness in connections that cannot resist corrosive gases, and susceptibility to temperature fluctuations causing flow disturbances. Thus, any hose substitution poses potential threats to etching stability, making HAINAR HYDRAULICS’ steel tube assemblies the only industrial-grade solution capable of carrying high-purity etching gases.
In today’s wafer manufacturing, yield management allows no defects. A tiny gas leak or pollution source can result in the scrapping of dozens of wafers or even equipment shutdown. HAINAR HYDRAULICS’ ultra-high purity steel tube assemblies silently guard gas purity, equipment stability, and product consistency as an invisible “lifeline”. “Choosing a high-quality ICP etching gas path system is not just selecting components, but also assuming responsibility for process stability, production safety, and future replicability,” said a spokesperson for HAINAR HYDRAULICS. With its professional R&D capabilities and rigorous quality control, HAINAR HYDRAULICS is committed to providing reliable fluid system solutions for the global semiconductor industry, empowering advanced manufacturing processes with high-performance products.
Post time: Jan-05-2026